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High NOx sensitivity of oxide thin films prepared by RF sputtering

Tanaka, S. / Esaka, T.

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High NOx sensitivity of oxide thin films prepared by RF sputtering

Tanaka, S. / Esaka, T.

High NOx sensitivity of oxide thin films prepared by RF sputtering

Tanaka, S. / Esaka, T.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

High NOx sensitivity of oxide thin films prepared by RF sputtering

Contributors:

Tanaka, S. (author) / Esaka, T. (author)

Published in:

MATERIALS RESEARCH BULLETIN ; 35 ; 2491-2502

Publication date:

2000-01-01

Size:

12 pages

ISSN:

0025-5408

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11 / 620

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