A platform for research: civil engineering, architecture and urbanism
Effect of process variables on the structure, residual stress, and hardness of sputtered nanocrystalline nickel films
Effect of process variables on the structure, residual stress, and hardness of sputtered nanocrystalline nickel films
Effect of process variables on the structure, residual stress, and hardness of sputtered nanocrystalline nickel films
Mitra, R. (author) / Hoffman, R. A. (author) / Madan, A. (author) / Weertman, J. R. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 16 ; 1010-1027
2001-01-01
18 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment
British Library Online Contents | 2009
|Structure, Property, Processing Relationships in Nanocrystalline Sputtered Magnetic Films
British Library Online Contents | 1995
|In situ study of deformation mechanisms in sputtered free-standing nanocrystalline nickel films
British Library Online Contents | 2004
|The Structure and Hardness of RF-Reactive Sputtered Ti-Zr-N Films
British Library Online Contents | 2005
|The Effect of Hardness on Eddy Current Residual Stress Profiling in Shot-Peened Nickel Alloys
British Library Online Contents | 2010
|