Miniaturization of silicon nanopillars below 10 nm by NH4OH, KOH and HF wet chemical etching for light emission study: Fid-Bau Portal

Miniaturization of silicon nanopillars below 10 nm by NH4OH, KOH and HF wet chemical etching for light emission study

Manimaran, M. / Tada, T. / Kanayama, T.

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Miniaturization of silicon nanopillars below 10 nm by NH4OH, KOH and HF wet chemical etching for light emission study

Manimaran, M. / Tada, T. / Kanayama, T.

Miniaturization of silicon nanopillars below 10 nm by NH4OH, KOH and HF wet chemical etching for light emission study

Manimaran, M. / Tada, T. / Kanayama, T.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Miniaturization of silicon nanopillars below 10 nm by NH4OH, KOH and HF wet chemical etching for light emission study

Contributors:

Manimaran, M. (author) / Tada, T. (author) / Kanayama, T. (author)

Published in:

MATERIALS LETTERS ; 48 ; 151-156

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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