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Wet chemical etching of ZnO films using NH x -based (NH4)2CO3 and NH4OH alkaline solution

Kim, J. K. / Lee, J. M.

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Wet chemical etching of ZnO films using NH x -based (NH4)2CO3 and NH4OH alkaline solution

Kim, J. K. / Lee, J. M.

Wet chemical etching of ZnO films using NH x -based (NH4)2CO3 and NH4OH alkaline solution

Kim, J. K. / Lee, J. M.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

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Document information

Title:

Wet chemical etching of ZnO films using NH x -based (NH4)2CO3 and NH4OH alkaline solution

Contributors:

Kim, J. K. (author) / Lee, J. M. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 52 ; 13054-13063

Publication date:

2017-01-01

Size:

10 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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