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Influence of structure development on atomic layer deposition of TiO2 thin films

Aarik, J. / Karlis, J. / Mandar, H. / Uustare, T. / Sammelselg, V.

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Influence of structure development on atomic layer deposition of TiO2 thin films

Aarik, J. / Karlis, J. / Mandar, H. / Uustare, T. / Sammelselg, V.

Influence of structure development on atomic layer deposition of TiO2 thin films

Aarik, J. / Karlis, J. / Mandar, H. / Uustare, T. / Sammelselg, V.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of structure development on atomic layer deposition of TiO2 thin films

Contributors:

Aarik, J. (author) / Karlis, J. (author) / Mandar, H. (author) / Uustare, T. (author) / Sammelselg, V. (author)

Published in:

APPLIED SURFACE SCIENCE ; 181 ; 339-348

Publication date:

2001-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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