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Compatibility Challenges for High-kappa Materials Integration into CMOS Technology

Guha, S. / Gusev, E. / Copel, M. / Ragnarsson, L.-A. / Buchanan, D. A.

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Compatibility Challenges for High-kappa Materials Integration into CMOS Technology

Guha, S. / Gusev, E. / Copel, M. / Ragnarsson, L.-A. / Buchanan, D. A.

Compatibility Challenges for High-kappa Materials Integration into CMOS Technology

Guha, S. / Gusev, E. / Copel, M. / Ragnarsson, L.-A. / Buchanan, D. A.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Compatibility Challenges for High-kappa Materials Integration into CMOS Technology

Contributors:

Guha, S. (author) / Gusev, E. (author) / Copel, M. (author) / Ragnarsson, L.-A. (author) / Buchanan, D. A. (author)

Published in:

MRS BULLETIN- MATERIALS RESEARCH SOCIETY ; 27 ; 226-231

Publication date:

2002-01-01

Size:

6 pages

ISSN:

0883-7694

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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