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    Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering

    New search for: Xia, A.
    New search for: Huizhao, Z.
    New search for: Li, Y.
    New search for: Chengshan, X.

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    Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering

    New search for: Xia, A.
    New search for: Huizhao, Z.
    New search for: Li, Y.
    New search for: Chengshan, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering

    New search for: Xia, A.
    New search for: Huizhao, Z.
    New search for: Li, Y.
    New search for: Chengshan, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering

    Contributors:

    Xia, A. (author) / Huizhao, Z. (author) / Li, Y. (author) / Chengshan, X. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 193 ; 87-91

    Publication date:

    2002-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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