Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition: Fid-Bau Portal

Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition

Zaghrioui, M. / Laffez, P. / Goudeau, P. / Thiaudiere, D.

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Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition

Zaghrioui, M. / Laffez, P. / Goudeau, P. / Thiaudiere, D.

Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition

Zaghrioui, M. / Laffez, P. / Goudeau, P. / Thiaudiere, D.

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Check availability in my library

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Document information

Title:

Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition

Contributors:

Zaghrioui, M. (author) / Laffez, P. (author) / Goudeau, P. (author) / Thiaudiere, D. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 21 ; 1379 - 1383

Publication date:

2002-01-01

Size:

5 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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