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Nanostructured Layers in High Temperature - Pressure Treated Silicon Implanted with Hydrogen / Helium

Misiuk, A. / Bak-Misiuk, J. / Kaniewska, M. / Zhuravlev, K. S. / Raineri, V. / Antonova, I. V.

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Nanostructured Layers in High Temperature - Pressure Treated Silicon Implanted with Hydrogen / Helium

Misiuk, A. / Bak-Misiuk, J. / Kaniewska, M. / Zhuravlev, K. S. / Raineri, V. / Antonova, I. V.

Nanostructured Layers in High Temperature - Pressure Treated Silicon Implanted with Hydrogen / Helium

Misiuk, A. / Bak-Misiuk, J. / Kaniewska, M. / Zhuravlev, K. S. / Raineri, V. / Antonova, I. V.

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Document information

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Document information

Title:

Nanostructured Layers in High Temperature - Pressure Treated Silicon Implanted with Hydrogen / Helium

Contributors:

Misiuk, A. (author) / Bak-Misiuk, J. (author) / Kaniewska, M. (author) / Zhuravlev, K. S. (author) / Raineri, V. (author) / Antonova, I. V. (author)

Published in:

MATERIALS PHYSICS AND MECHANICS ; 5 ; 31-38

Publication date:

2002-01-01

Size:

8 pages

ISSN:

1605-2730

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 531

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