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Effect of uniform stress on silicon implanted with helium, hydrogen and oxygen

Misiuk, A. / Bak-Misiuk, J. / Antonova, I. V. / Raineri, V. / Romano-Rodriguez, A. / Bachrouri, A. / Surma, H. B. / Ratajczak, J. / Katcki, J. / Adamczewska, J.

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Effect of uniform stress on silicon implanted with helium, hydrogen and oxygen

Misiuk, A. / Bak-Misiuk, J. / Antonova, I. V. / Raineri, V. / Romano-Rodriguez, A. / Bachrouri, A. / Surma, H. B. / Ratajczak, J. / Katcki, J. / Adamczewska, J.

Effect of uniform stress on silicon implanted with helium, hydrogen and oxygen

Misiuk, A. / Bak-Misiuk, J. / Antonova, I. V. / Raineri, V. / Romano-Rodriguez, A. / Bachrouri, A. / Surma, H. B. / Ratajczak, J. / Katcki, J. / Adamczewska, J.

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Title:

Effect of uniform stress on silicon implanted with helium, hydrogen and oxygen

Contributors:

Misiuk, A. (author) / Bak-Misiuk, J. (author) / Antonova, I. V. (author) / Raineri, V. (author) / Romano-Rodriguez, A. (author) / Bachrouri, A. (author) / Surma, H. B. (author) / Ratajczak, J. (author) / Katcki, J. (author) / Adamczewska, J. (author)

Published in:

COMPUTATIONAL MATERIALS SCIENCE ; 21 ; 515-525

Publication date:

2001-01-01

Size:

11 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

DDC: 620.1 / 510

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

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