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    Ultrathin silicon oxide film growth with in situ passivation by using pyrolytic N2O

    New search for: Yamada, H.

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    Ultrathin silicon oxide film growth with in situ passivation by using pyrolytic N2O

    New search for: Yamada, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Ultrathin silicon oxide film growth with in situ passivation by using pyrolytic N2O

    New search for: Yamada, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Ultrathin silicon oxide film growth with in situ passivation by using pyrolytic N2O

    Contributors:

    Yamada, H. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 21 ; 1493 - 1495

    Publication date:

    2002-01-01

    Size:

    3 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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