Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique: Fid-Bau Portal

Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique

Wang, X. j. / Lei, Q. s. / Xu, W. / Zhou, W. l. / Yu, J.

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Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique

Wang, X. j. / Lei, Q. s. / Xu, W. / Zhou, W. l. / Yu, J.

Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique

Wang, X. j. / Lei, Q. s. / Xu, W. / Zhou, W. l. / Yu, J.

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Check availability in my library

Order at Subito €

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Document information

Title:

Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique

Contributors:

Wang, X. j. (author) / Lei, Q. s. (author) / Xu, W. (author) / Zhou, W. l. (author) / Yu, J. (author)

Published in:

MATERIALS LETTERS ; 63 ; 1371-1373

Publication date:

2009-01-01

Size:

3 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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