A platform for research: civil engineering, architecture and urbanism
Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3
Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3
Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3
Ramanuja, N. (author) / Levy, R. A. (author) / Dharmadhikari, S. N. (author) / Ramos, E. (author) / Pearce, C. W. (author) / Menasian, S. C. (author) / Schamberger, P. C. (author) / Collins, C. C. (author)
MATERIALS LETTERS ; 57 ; 261-269
2002-01-01
9 pages
Article (Journal)
English
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4
British Library Online Contents | 2004
|Micromechanical characterization of chemically vapor deposited ceramic films
British Library Online Contents | 1994
|British Library Online Contents | 2000
|Crystallization and sintering characteristics of chemically vapor deposited silicon nitride powders
British Library Online Contents | 1992
|Crystallization and sintering characteristics of chemically vapor deposited silicon nitride powders
British Library Online Contents | 1992
|