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Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy
Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy
Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy
Zhao, J. (author) / Garza, E. G. (author) / Lam, K. (author) / Jones, C. M. (author)
APPLIED SURFACE SCIENCE ; 158 ; 246-251
2000-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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