Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy: Fid-Bau Portal

Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy

Zhao, J. / Garza, E. G. / Lam, K. / Jones, C. M.

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Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy

Zhao, J. / Garza, E. G. / Lam, K. / Jones, C. M.

Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy

Zhao, J. / Garza, E. G. / Lam, K. / Jones, C. M.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy

Contributors:

Zhao, J. (author) / Garza, E. G. (author) / Lam, K. (author) / Jones, C. M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 158 ; 246-251

Publication date:

2000-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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