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A platform for research: civil engineering, architecture and urbanism
The dose dependence of Si sputtering with low energy ions in shallow depth profiling
The dose dependence of Si sputtering with low energy ions in shallow depth profiling
The dose dependence of Si sputtering with low energy ions in shallow depth profiling
Moon, D. W. (author) / Lee, H. I. (author)
APPLIED SURFACE SCIENCE ; 203-204 ; 27-29
2003-01-01
3 pages
Article (Journal)
English
DDC:
621.35
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