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Quantitative depth profiling of nitrogen in ultrathin oxynitride film with low energy SIMS

Shon, H. K. / Kang, H. J. / Hong, T. E. / Chang, H. S. / Kim, K. J. / Kim, H. K. / Moon, D. W.

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Quantitative depth profiling of nitrogen in ultrathin oxynitride film with low energy SIMS

Shon, H. K. / Kang, H. J. / Hong, T. E. / Chang, H. S. / Kim, K. J. / Kim, H. K. / Moon, D. W.

Quantitative depth profiling of nitrogen in ultrathin oxynitride film with low energy SIMS

Shon, H. K. / Kang, H. J. / Hong, T. E. / Chang, H. S. / Kim, K. J. / Kim, H. K. / Moon, D. W.

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Document information

Title:

Quantitative depth profiling of nitrogen in ultrathin oxynitride film with low energy SIMS

Contributors:

Shon, H. K. (author) / Kang, H. J. (author) / Hong, T. E. (author) / Chang, H. S. (author) / Kim, K. J. (author) / Kim, H. K. (author) / Moon, D. W. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 423-426

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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