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Ultra low energy SIMS depth profiling of sub-1.5nm silicon oxynitride films

Mulcahy, C. P. / Bock, B. / Ebblewhite, P. A. / Hebert, H. P. / Biswas, S.

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Ultra low energy SIMS depth profiling of sub-1.5nm silicon oxynitride films

Mulcahy, C. P. / Bock, B. / Ebblewhite, P. A. / Hebert, H. P. / Biswas, S.

Ultra low energy SIMS depth profiling of sub-1.5nm silicon oxynitride films

Mulcahy, C. P. / Bock, B. / Ebblewhite, P. A. / Hebert, H. P. / Biswas, S.

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Check availability in my library

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Document information

Title:

Ultra low energy SIMS depth profiling of sub-1.5nm silicon oxynitride films

Contributors:

Mulcahy, C. P. (author) / Bock, B. (author) / Ebblewhite, P. A. (author) / Hebert, H. P. (author) / Biswas, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 7198-7200

Publication date:

2006-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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