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    Development of New Mica Abrasives Suitable for High Performance Mechanochemical Polishing of Si Wafers

    New search for: Yasunaga, N.
    New search for: Okada, S.
    New search for: Gao, Y.
    New search for: Tamaki, J.
    New search for: Kitajima, K.

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    Development of New Mica Abrasives Suitable for High Performance Mechanochemical Polishing of Si Wafers

    New search for: Yasunaga, N.
    New search for: Okada, S.
    New search for: Gao, Y.
    New search for: Tamaki, J.
    New search for: Kitajima, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Development of New Mica Abrasives Suitable for High Performance Mechanochemical Polishing of Si Wafers

    New search for: Yasunaga, N.
    New search for: Okada, S.
    New search for: Gao, Y.
    New search for: Tamaki, J.
    New search for: Kitajima, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Development of New Mica Abrasives Suitable for High Performance Mechanochemical Polishing of Si Wafers

    Contributors:

    Yasunaga, N. (author) / Okada, S. (author) / Gao, Y. / Tamaki, J. / Kitajima, K.

    Published in:

    Advances in Abrasive Technology V ; 253-256

    KEY ENGINEERING MATERIALS

    Publication date:

    2003-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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