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Characterization of low-k porous silica films incorporated with alkylene groups

Uchida, Y. / Katoh, T. / Oikawa, M.

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Characterization of low-k porous silica films incorporated with alkylene groups

Uchida, Y. / Katoh, T. / Oikawa, M.

Characterization of low-k porous silica films incorporated with alkylene groups

Uchida, Y. / Katoh, T. / Oikawa, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characterization of low-k porous silica films incorporated with alkylene groups

Contributors:

Uchida, Y. (author) / Katoh, T. (author) / Oikawa, M. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 259-264

Publication date:

2002-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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