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Thermomechanical Lithography: Pattern Replication Using a Temperature Gradient Driven Instability
Thermomechanical Lithography: Pattern Replication Using a Temperature Gradient Driven Instability
Thermomechanical Lithography: Pattern Replication Using a Temperature Gradient Driven Instability
Schaffer, E. (author) / Harkema, S. (author) / Roerdink, M. (author) / Blossey, R. (author) / Steiner, U. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 15 ; 514-517
2003-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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