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A platform for research: civil engineering, architecture and urbanism
Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication
Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication
Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication
Yu, T. (author) / Ober, C. K. (author) / Kuebler, S. M. (author) / Zhou, W. (author) / Marder, S. R. (author) / Perry, J. W. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 15 ; 517-521
2003-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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