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Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Wu, H. (author) / Gonsalves, K. E. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 13 ; 670-672
2001-01-01
3 pages
Article (Journal)
English
DDC:
620.11
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