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Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication
Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication
Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication
Yu, T. (Autor:in) / Ober, C. K. (Autor:in) / Kuebler, S. M. (Autor:in) / Zhou, W. (Autor:in) / Marder, S. R. (Autor:in) / Perry, J. W. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 15 ; 517-521
01.01.2003
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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