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    Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications

    New search for: Lee, Y. J.
    New search for: Kim, K. N.
    New search for: Song, B. K.
    New search for: Yeom, G. Y.

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    Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications

    New search for: Lee, Y. J.
    New search for: Kim, K. N.
    New search for: Song, B. K.
    New search for: Yeom, G. Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications

    New search for: Lee, Y. J.
    New search for: Kim, K. N.
    New search for: Song, B. K.
    New search for: Yeom, G. Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications

    Contributors:

    Lee, Y. J. (author) / Kim, K. N. (author) / Song, B. K. (author) / Yeom, G. Y. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 419-423

    Publication date:

    2002-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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