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Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications
Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications
Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications
Lee, Y. J. (author) / Kim, K. N. (author) / Song, B. K. (author) / Yeom, G. Y. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 419-423
2002-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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