Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine: Fid-Bau Portal

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Blackman, C. S. / Carmalt, C. J. / O'Neill, S. A. / Parkin, I. P. / Apostolico, L. / Molloy, K. C.

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Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Blackman, C. S. / Carmalt, C. J. / O'Neill, S. A. / Parkin, I. P. / Apostolico, L. / Molloy, K. C.

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Blackman, C. S. / Carmalt, C. J. / O'Neill, S. A. / Parkin, I. P. / Apostolico, L. / Molloy, K. C.

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Title:

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Contributors:

Blackman, C. S. (author) / Carmalt, C. J. (author) / O'Neill, S. A. (author) / Parkin, I. P. (author) / Apostolico, L. (author) / Molloy, K. C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 211 ; 2-5

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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