On material removal capability of abrasive particle in polishing process

Su, Y.-T. / Hung, T.-C. / Tsai, C.-M. | British Library Online Contents | 2003

Modeling effects of abrasive particle size and concentration on material removal at molecular scale in chemical mechanical polishing

Wang, Y. / Zhao, Y. / An, W. et al. | British Library Online Contents | 2010

The Characteristic of Abrasive Particle in Chemical - Mechanical Polishing

Tsai, H. J. / Chang, C. C. / Jeng, Y. R. et al. | British Library Online Contents | 2006

Effects of particle size, polishing pad and contact pressure in free abrasive polishing

Xie, Y. / Bhushan, B. | British Library Online Contents | 1996

Vibration-Assisted Magnetic Abrasive Polishing

Yin, S. / Shinmura, T. | British Library Online Contents | 2007