Chemical and electronic structures of Lu2O3/Si interfacial transition layer: Fid-Bau Portal

Chemical and electronic structures of Lu2O3/Si interfacial transition layer

Nohira, H. / Shiraishi, T. / Nakamura, T. / Takahashi, K. / Takeda, M. / Ohmi, S. / Iwai, H. / Hattori, T.

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Chemical and electronic structures of Lu2O3/Si interfacial transition layer

Nohira, H. / Shiraishi, T. / Nakamura, T. / Takahashi, K. / Takeda, M. / Ohmi, S. / Iwai, H. / Hattori, T.

Chemical and electronic structures of Lu2O3/Si interfacial transition layer

Nohira, H. / Shiraishi, T. / Nakamura, T. / Takahashi, K. / Takeda, M. / Ohmi, S. / Iwai, H. / Hattori, T.

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Document information

Title:

Chemical and electronic structures of Lu2O3/Si interfacial transition layer

Contributors:

Nohira, H. (author) / Shiraishi, T. (author) / Nakamura, T. (author) / Takahashi, K. (author) / Takeda, M. (author) / Ohmi, S. (author) / Iwai, H. (author) / Hattori, T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 216 ; 234-238

Publication date:

2003-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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