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Oxygen radical treatment applied to ferroelectric thin films
Oxygen radical treatment applied to ferroelectric thin films
Oxygen radical treatment applied to ferroelectric thin films
Takahashi, I. (author) / Sakurai, H. (author) / Yamada, A. (author) / Funaiwa, K. (author) / Hirai, K. (author) / Urabe, S. (author) / Goto, T. (author) / Hirayama, M. (author) / Teramoto, A. (author) / Sugawa, S. (author)
APPLIED SURFACE SCIENCE ; 216 ; 239-245
2003-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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