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Si submonolayer and monolayer digital growth operation techniques using Si2H6 as atomically controlled growth nanotechnology
Si submonolayer and monolayer digital growth operation techniques using Si2H6 as atomically controlled growth nanotechnology
Si submonolayer and monolayer digital growth operation techniques using Si2H6 as atomically controlled growth nanotechnology
Suda, Y. (author) / Hosoya, N. (author) / Miki, K. (author)
APPLIED SURFACE SCIENCE ; 216 ; 424-430
2003-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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