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    Electrochemical polishing of copper for microelectronic applications

    New search for: Huo, J.
    New search for: Solanki, R.
    New search for: McAndrew, J.

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    Electrochemical polishing of copper for microelectronic applications

    New search for: Huo, J.
    New search for: Solanki, R.
    New search for: McAndrew, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrochemical polishing of copper for microelectronic applications

    New search for: Huo, J.
    New search for: Solanki, R.
    New search for: McAndrew, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Electrochemical polishing of copper for microelectronic applications

    Contributors:

    Huo, J. (author) / Solanki, R. (author) / McAndrew, J. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 19 ; 11-16

    Publication date:

    2003-01-01

    Size:

    6 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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