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Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
Giannazzo, F. (author) / Mirabella, S. (author) / Raineri, V. (author) / De Salvador, D. (author) / Napolitani, E. (author) / Terrasi, A. (author) / Carnera, A. (author) / Drigo, A. V. (author) / Priolo, F. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 148-151
2003-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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