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Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
Two-dimensional interstitial diffusion in silicon monitored by scanning capacitance microscopy
Giannazzo, F. (Autor:in) / Mirabella, S. (Autor:in) / Raineri, V. (Autor:in) / De Salvador, D. (Autor:in) / Napolitani, E. (Autor:in) / Terrasi, A. (Autor:in) / Carnera, A. (Autor:in) / Drigo, A. V. (Autor:in) / Priolo, F. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 148-151
01.01.2003
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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