Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition: Fid-Bau Portal

Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition

Wang, Y. H. / Lin, J. / Huan, C. H.

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Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition

Wang, Y. H. / Lin, J. / Huan, C. H.

Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition

Wang, Y. H. / Lin, J. / Huan, C. H.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition

Contributors:

Wang, Y. H. (author) / Lin, J. (author) / Huan, C. H. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 104 ; 80-87

Publication date:

2003-01-01

Size:

8 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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