Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques: Fid-Bau Portal

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H. / Kim, Y. J. / Whang, C. M. / Cho, W. S. / Yoo, Y. C. / Kim, J. G. / Kwon, Y. J.

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Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H. / Kim, Y. J. / Whang, C. M. / Cho, W. S. / Yoo, Y. C. / Kim, J. G. / Kwon, Y. J.

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H. / Kim, Y. J. / Whang, C. M. / Cho, W. S. / Yoo, Y. C. / Kim, J. G. / Kwon, Y. J.

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Title:

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Contributors:

Shim, J. H. (author) / Cho, N. H. (author) / Kim, Y. J. (author) / Whang, C. M. (author) / Cho, W. S. (author) / Yoo, Y. C. (author) / Kim, J. G. (author) / Kwon, Y. J. (author) / Kim, H. S. / Li, Y. B.

Published in:

Eco-Materials Processing & Design VII: Proceedings of the Conference of the 7^t^h International Symposium on Eco-Materials Processing & Design January 8-11, 2006, Chengdu, China ; 962-965

MATERIALS SCIENCE FORUM ; 510/511

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Shim, J. H. / Im, S. / Cho, N. H. | British Library Online Contents | 2004

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Shim, J. H. / Cho, N. H. / Im, S. G. | British Library Online Contents | 2004

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Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

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