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Formation of copper silicides by high dose metal vapor vacuum arc ion implantation

Rong, C. / Zhang, J. / Li, W.

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Formation of copper silicides by high dose metal vapor vacuum arc ion implantation

Rong, C. / Zhang, J. / Li, W.

Formation of copper silicides by high dose metal vapor vacuum arc ion implantation

Rong, C. / Zhang, J. / Li, W.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Formation of copper silicides by high dose metal vapor vacuum arc ion implantation

Contributors:

Rong, C. (author) / Zhang, J. (author) / Li, W. (author)

Published in:

APPLIED SURFACE SCIENCE ; 220 ; 40-45

Publication date:

2003-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Benkerri, M. / Halimi, R. / Bouabellou, A. et al. | British Library Online Contents | 2004

Valence band structure of metal silicides modified by argon ion implantation

Yamauchi, S. / Hasebe, Y. / Ohshima, H. et al. | British Library Online Contents | 1996

Electroless Copper Deposition on Metals and Metal Silicides

Mak, C. Y. | British Library Online Contents | 1994

Valence band structure of metal silicides modified by argon ion implantation

Yamauchi, S. / Hasebe, Y. / Ohshima, H. et al. | British Library Online Contents | 1996

Metal Silicide/Silicon Nanowires from Metal Vapor Vacuum Arc Implantation

Li, C. P. / Wang, N. / Wong, S. P. et al. | British Library Online Contents | 2002