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Formation of copper silicides by high dose metal vapor vacuum arc ion implantation
APPLIED SURFACE SCIENCE ; 220 ; 40-45
01.01.2003
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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British Library Online Contents | 2004
|Valence band structure of metal silicides modified by argon ion implantation
British Library Online Contents | 1996
|Electroless Copper Deposition on Metals and Metal Silicides
British Library Online Contents | 1994
|Metal Silicide/Silicon Nanowires from Metal Vapor Vacuum Arc Implantation
British Library Online Contents | 2002
|Valence band structure of metal silicides modified by argon ion implantation
British Library Online Contents | 1996
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