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Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics
Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics
Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics
Koumoto, K. (author) / Masuda, Y. (author) / Wang, D. J. (author) / Uematsu, K. / Yokokawa, H.
2003-01-01
12 pages
Article (Journal)
English
DDC:
620.11
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