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    Effects of the interfacial layer on electrical characteristics of Al2O3/TiO2/Al2O3 thin films for gate dielectrics

    New search for: Kim, C. E.
    New search for: Yun, I.

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    Effects of the interfacial layer on electrical characteristics of Al2O3/TiO2/Al2O3 thin films for gate dielectrics

    New search for: Kim, C. E.
    New search for: Yun, I.

    Access

    Access via TIB
    Check availability in my library
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    Effects of the interfacial layer on electrical characteristics of Al2O3/TiO2/Al2O3 thin films for gate dielectrics

    New search for: Kim, C. E.
    New search for: Yun, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Effects of the interfacial layer on electrical characteristics of Al2O3/TiO2/Al2O3 thin films for gate dielectrics

    Contributors:

    Kim, C. E. (author) / Yun, I. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 3089-3093

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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