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    Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors

    New search for: Aoki, Y.
    New search for: Kunitake, T.

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    Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors

    New search for: Aoki, Y.
    New search for: Kunitake, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors

    New search for: Aoki, Y.
    New search for: Kunitake, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Title:

    Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors

    Contributors:

    Aoki, Y. (author) / Kunitake, T. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 16 ; 118-123

    Publication date:

    2004-01-01

    Size:

    6 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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