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Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors
Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors
Solution-based Fabrication of High-kappa Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors
Aoki, Y. (Autor:in) / Kunitake, T. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 16 ; 118-123
01.01.2004
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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