Reactive ion etching of Si1-xGex alloy with hydrogen bromide: Fid-Bau Portal

Reactive ion etching of Si1-xGex alloy with hydrogen bromide

Wang, C. S. / Shu, D. Y. / Hsieh, W. Y. / Tsai, M. J.

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Reactive ion etching of Si1-xGex alloy with hydrogen bromide

Wang, C. S. / Shu, D. Y. / Hsieh, W. Y. / Tsai, M. J.

Reactive ion etching of Si1-xGex alloy with hydrogen bromide

Wang, C. S. / Shu, D. Y. / Hsieh, W. Y. / Tsai, M. J.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Reactive ion etching of Si1-xGex alloy with hydrogen bromide

Contributors:

Wang, C. S. (author) / Shu, D. Y. (author) / Hsieh, W. Y. (author) / Tsai, M. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 224 ; 222-226

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Ab initio studies of the Si1-xGex alloy and its intrinsic defects

Venezuela, P. / da Silva, A. J. / da Silva, C. et al. | British Library Online Contents | 2001

Sidewall protection by nitrogen and oxygen in poly-Si1-xGex anisotropic etching using Cl2/N2/O2 plasma

Cho, H. S. / Takehiro, S. / Sakuraba, M. et al. | British Library Online Contents | 2005

Raman spectroscopy of Si1-xGex epilayers

Pezzoli, F. / Martinelli, L. / Grilli, E. et al. | British Library Online Contents | 2005

Ripple morphologies on ion irradiated Si1-xGex

Sarkar, S. / Van Daele, B. / Vandervorst, W. | British Library Online Contents | 2008