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Etching characteristics of TiNi thin film by focused ion beam
Etching characteristics of TiNi thin film by focused ion beam
Etching characteristics of TiNi thin film by focused ion beam
Xie, D. Z. (author) / Ngoi, B. K. (author) / Fu, Y. Q. (author) / Ong, A. S. (author) / Lim, B. H. (author)
APPLIED SURFACE SCIENCE ; 225 ; 54-58
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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