Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Ru and RuO2 gate electrodes for advanced CMOS technology

    New search for: Frohlich, K.
    New search for: Husekova, K.
    New search for: Machajdik, D.
    New search for: Hooker, J. C.
    New search for: Perez, N.
    New search for: Fanciulli, M.
    New search for: Ferrari, S.
    New search for: Wiemer, C.
    New search for: Dimoulas, A.
    New search for: Vellianitis, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Ru and RuO2 gate electrodes for advanced CMOS technology

    New search for: Frohlich, K.
    New search for: Husekova, K.
    New search for: Machajdik, D.
    New search for: Hooker, J. C.
    New search for: Perez, N.
    New search for: Fanciulli, M.
    New search for: Ferrari, S.
    New search for: Wiemer, C.
    New search for: Dimoulas, A.
    New search for: Vellianitis, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Ru and RuO2 gate electrodes for advanced CMOS technology

    New search for: Frohlich, K.
    New search for: Husekova, K.
    New search for: Machajdik, D.
    New search for: Hooker, J. C.
    New search for: Perez, N.
    New search for: Fanciulli, M.
    New search for: Ferrari, S.
    New search for: Wiemer, C.
    New search for: Dimoulas, A.
    New search for: Vellianitis, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Ru and RuO2 gate electrodes for advanced CMOS technology

    Contributors:

    Frohlich, K. (author) / Husekova, K. (author) / Machajdik, D. (author) / Hooker, J. C. (author) / Perez, N. (author) / Fanciulli, M. (author) / Ferrari, S. (author) / Wiemer, C. (author) / Dimoulas, A. (author) / Vellianitis, G. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 109 ; 117-121

    Publication date:

    2004-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks

    Zhu, X. / Zhu, J.-m. / Li, A. et al. | British Library Online Contents | 2009

    Effect of organic vehicle addition on service lifetime of Ti/IrO2-RuO2 electrodes

    Chae, K. S. / Choi, H. K. / Ahn, J. H. et al. | British Library Online Contents | 2002

    Application of Ru-based gate materials for CMOS technology

    Tapajna, M. / Pisecny, P. / Luptak, R. et al. | British Library Online Contents | 2004

    Electrochemical Degradation of Cyanobacterial Toxin Microcystin-LR Using Ti/RuO2 Electrodes in a Continuous Tubular Reactor

    Liang, W. / Qu, J. / Wang, K. et al. | British Library Online Contents | 2008

    Electrochemical wastewater treatment for denitrification and toxic organic degradation using Ti-based SnO2 and RuO2 electrodes

    Xie, Zhaoming | UB Braunschweig | 2000

    Free access
    Back to top