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Application of Ru-based gate materials for CMOS technology

Tapajna, M. / Pisecny, P. / Luptak, R. / Husekova, K. / Frohlich, K. / Harmatha, L. / Hooker, J. C. / Roozeboom, F. / Jergel, J.

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Application of Ru-based gate materials for CMOS technology

Tapajna, M. / Pisecny, P. / Luptak, R. / Husekova, K. / Frohlich, K. / Harmatha, L. / Hooker, J. C. / Roozeboom, F. / Jergel, J.

Application of Ru-based gate materials for CMOS technology

Tapajna, M. / Pisecny, P. / Luptak, R. / Husekova, K. / Frohlich, K. / Harmatha, L. / Hooker, J. C. / Roozeboom, F. / Jergel, J.

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Title:

Application of Ru-based gate materials for CMOS technology

Contributors:

Tapajna, M. (author) / Pisecny, P. (author) / Luptak, R. (author) / Husekova, K. (author) / Frohlich, K. (author) / Harmatha, L. (author) / Hooker, J. C. (author) / Roozeboom, F. (author) / Jergel, J. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 271-276

Publication date:

2004-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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