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Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks
Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks
Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks
Zhu, X. (author) / Zhu, J.-m. (author) / Li, A. (author) / Liu, Z. (author) / Ming, N. (author)
JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 25 ; 289-313
2009-01-01
25 pages
Article (Journal)
English
DDC:
620.11
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