Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks: Fid-Bau Portal

Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks

Zhu, X. / Zhu, J.-m. / Li, A. / Liu, Z. / Ming, N.

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Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks

Zhu, X. / Zhu, J.-m. / Li, A. / Liu, Z. / Ming, N.

Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks

Zhu, X. / Zhu, J.-m. / Li, A. / Liu, Z. / Ming, N.

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Check availability in my library

Order at Subito €

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Document information

Title:

Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks

Contributors:

Zhu, X. (author) / Zhu, J.-m. (author) / Li, A. (author) / Liu, Z. (author) / Ming, N. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 25 ; 289-313

Publication date:

2009-01-01

Size:

25 pages

ISSN:

1005-0302

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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