Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Low Temperature ECR-PECVD Microcrystalline SiC Growth by Pulsed Gas Flows

    New search for: Hernandez, M. J.
    New search for: Cervera, M.
    New search for: Piqueras, J.
    New search for: del Cano, T.
    New search for: Jimenez, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Low Temperature ECR-PECVD Microcrystalline SiC Growth by Pulsed Gas Flows

    New search for: Hernandez, M. J.
    New search for: Cervera, M.
    New search for: Piqueras, J.
    New search for: del Cano, T.
    New search for: Jimenez, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low Temperature ECR-PECVD Microcrystalline SiC Growth by Pulsed Gas Flows

    New search for: Hernandez, M. J.
    New search for: Cervera, M.
    New search for: Piqueras, J.
    New search for: del Cano, T.
    New search for: Jimenez, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Low Temperature ECR-PECVD Microcrystalline SiC Growth by Pulsed Gas Flows

    Contributors:

    Hernandez, M. J. (author) / Cervera, M. (author) / Piqueras, J. (author) / del Cano, T. (author) / Jimenez, J. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 457/460 ; 309-312

    Publication date:

    2004-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    The Study of Microcrystalline Silicon Thin Films Prepared by PECVD

    Li, C.Y. / Zhang, H. / Li, J. et al. | British Library Online Contents | 2013

    The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method

    Chen, Y. / Chen, X. / Hao, X. et al. | British Library Online Contents | 2013

    Hydrogenated microcrystalline silicon films prepared by VHF-PECVD and single junction solar cell

    Wu, Z. / Lei, Q. / Xi, J. et al. | British Library Online Contents | 2006

    Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

    Li, D. / Bulou, S. / Gautier, N. et al. | British Library Online Contents | 2019

    Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

    Li, D. / Bulou, S. / Gautier, N. et al. | British Library Online Contents | 2019

    Back to top