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The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method

Chen, Y. / Chen, X. / Hao, X. / Lu, J. / Yang, S. e.

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The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method

Chen, Y. / Chen, X. / Hao, X. / Lu, J. / Yang, S. e.

The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method

Chen, Y. / Chen, X. / Hao, X. / Lu, J. / Yang, S. e.

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Order at Subito €

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Document information

Title:

The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method

Contributors:

Chen, Y. (author) / Chen, X. (author) / Hao, X. (author) / Lu, J. (author) / Yang, S. e. (author)

Published in:

APPLIED SURFACE SCIENCE ; 270 ; 737-740

Publication date:

2013-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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