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    Influence of surface orientation on the formation of sputtering-induced ripple topography in silicon

    New search for: Fares, B.
    New search for: Gautier, B.
    New search for: Baboux, N.
    New search for: Prudon, G.
    New search for: Holliger, P.
    New search for: Dupuy, J. C.

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    Influence of surface orientation on the formation of sputtering-induced ripple topography in silicon

    New search for: Fares, B.
    New search for: Gautier, B.
    New search for: Baboux, N.
    New search for: Prudon, G.
    New search for: Holliger, P.
    New search for: Dupuy, J. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of surface orientation on the formation of sputtering-induced ripple topography in silicon

    New search for: Fares, B.
    New search for: Gautier, B.
    New search for: Baboux, N.
    New search for: Prudon, G.
    New search for: Holliger, P.
    New search for: Dupuy, J. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Influence of surface orientation on the formation of sputtering-induced ripple topography in silicon

    Contributors:

    Fares, B. (author) / Gautier, B. (author) / Baboux, N. (author) / Prudon, G. (author) / Holliger, P. (author) / Dupuy, J. C. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 231/232 ; 678-683

    Publication date:

    2004-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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