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Study on change in SIMS intensities near the interface between silicon-nitride film and silicon substrate
Study on change in SIMS intensities near the interface between silicon-nitride film and silicon substrate
Study on change in SIMS intensities near the interface between silicon-nitride film and silicon substrate
Hasegawa, T. (author) / Date, T. (author) / Karen, A. (author) / Masuda, A. (author)
APPLIED SURFACE SCIENCE ; 231/232 ; 725-728
2004-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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