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Dependence of SiO2/Si interface structure on low-temperature oxidation process
Dependence of SiO2/Si interface structure on low-temperature oxidation process
Dependence of SiO2/Si interface structure on low-temperature oxidation process
Hattori, T. (author) / Azuma, K. (author) / Nakata, Y. (author) / Shioji, M. (author) / Shiraishi, T. (author) / Yoshida, T. (author) / Takahashi, K. (author) / Nohira, H. (author) / Takata, Y. (author) / Shin, S. (author)
APPLIED SURFACE SCIENCE ; 234 ; 197-201
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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